PORT WASHINGTON, NY—Pall Corp. will build a new facility in western Singapore to make lithography, and wet-etch filtration, separation and purification products that help the advanced node process during semiconductor manufacturing.
Pall is spending more than $100 million for the first phase of expansion, with subsequent investments over the course of construction. The facility will be located on a seven-acre campus that will include more than 18,000 square meters of manufacturing and office space.
Construction of the first phase will begin this summer, and high-volume manufacturing capability will be completed between late 2023 and early 2024. Additional capacity will be added in subsequent years as the site undergoes a phased ramp to its full potential. When completed, the site will more than double Pall's current installed capacity for manufacturing microelectronics filtration and purification products.
"With the construction of this new facility, we will bring a greater percentage of our manufacturing capacity closer to the manufacturing base of the majority of our customers, which will help reduce supply chain complexity and risk," says Shangaza Dasent, vice president and general manager of Pall's Microelectronics business unit.
To support the new site, the company plans to hire more than 300 employees with science, engineering and manufacturing experience.